NGK INSULATORS, LTD.


Global menu

  1. Home>
  2. CSR>
  3. Creation of New Value

Main contents.

Creation of New Value

  • Contact

Utilizing its proprietary advanced ceramics technology, the NGK Group works to contribute to a better society, and provide products and services that deliver new value to society.

Highlight
PACE Award for Development of NOx Sensors

Automotive sensors that measure vehicle NOx concentrations in real time

In April 2010, NGK and Continental AG (Germany) were joint recipients of a PACE* Award for the development of high-precision automotive NOx sensors. The prestigious PACE Awards are sponsored by Automotive News, a major U.S. magazine specializing in automobiles. Awards are given to suppliers for their contribution to the automotive industry through the development of innovative technologies.

NOx sensors are the world’s first sensors capable of measuring concentrations of nitrogen oxides (NOx) in real time at the parts per million (ppm) level. NOx is a component of vehicle exhaust implicated in photochemical smog, acid rain and other atmospheric pollution. The sensors have been credited with making possible fuel-efficient, clean diesel vehicles capable of clearing increasingly strict vehicle exhaust regulations.

Greater demand is projected for NOx sensors going forward, especially in Europe and the United States. As products that contribute to protecting the global environment, NOx sensors from NGK are ready to meet the expectations of society and our customers.

* PACE : Premier Automotive Supplier's Contribution to Excellence

Commemorative PACE Award trophy

Commemorative PACE
Award trophy

Joint receipt of award in the Product Europa category with Continental AG

Joint receipt of award in the Product
Europa category with Continental AG

NOx sensors

NOx sensors

Awarded Incentive Award of the Commissioner of Japan Patent Office

In October 2010, NGK’s NOx sensors received the Incentive Award of the Commissioner of Japan Patent Office and the Achievement Award at the Chubu Local Commendation for Invention, sponsored by the Japan Institute of Invention and Innovation (JIII). The sensors were highly rated for their technological superiority and efficacy, as well as for their contribution to the development of local industry.

Development of Alumina-based Coulomb Electrostatic Chuck

Electrostatic chucks are sought after as core components inside semiconductor manufacturing equipment, where they are used as stands on which semiconductor substrates - known as wafers - are placed. NGK has developed alumina-based Coulomb electrostatic chucks that use the Coulomb force (electrical attraction) to hold wafers in place.

High dielectric resistance is achieved by turning high-purity alumina (aluminum oxide) into dense crystals. The strength of the adhesive force (Coulomb force) is such that there is little current leakage even at high voltages, resulting in less damage to wafers. Furthermore, NGK’s pursuit of the extreme limits of thinness has raised thermal conductivity, making it possible to uniformly adjust the temperature of wafers as large as 300 mm in diameter.

Leveraging the superior characteristics of ceramics, NGK is contributing heavily to improved productivity in the semiconductor manufacturing process, where cutting-edge technologies compete.

Key Elements of the Semiconductor Manufacturing Process

Key Elements of the Semiconductor Manufacturing Process

Development of High-Performance Firing Kiln for Lithium-ion Battery Materials

Roller hearth kiln (prototype)

Roller hearth kiln (prototype)

The roller hearth kiln developed by NGK is a highperformance kiln used to sinter a variety of powdered materials, including cathode materials for lithium-ion batteries. Such batteries are expected to experience an expansion in demand for use in cars in the future.

The firing chamber is divided into smaller parts by shutters, enabling diff erent atmospheric conditions using nitrogen or oxygen gas to be set in each smaller chamber. Heat can then be applied individually, allowing for extremely precise temperature control and making uniform heat application and diverse temperature curves possible.

Furthermore, ceramic parts are used in the transport structure where metal rollers and containers holding powdered materials come into contact. This step helps keep metal dust caused by friction from inadvertently mixing with target materials. This is just one example of the close attention NGK has given to preventing contamination from foreign substances inside the kiln.

Moreover, in combination with proprietary heat simulation software, NGK is now able to analyze the optimal conditions needed in 1/50th the time once required, greatly shrinking lead times for developing new materials.

In addition to cathode materials for lithium-ion batteries, the new kiln is enabling higher performance and more efficient development of materials such as barium titanate, magnesium oxide, phosphors for fl at display panels, and ceramic capacitors.

Development of World’s First Water Separation Membrane for Treatment of Acidic Liquids

Ceramic membrane element (diameter: 180 mm, total length: 1,000 mm), System for separation of water content from solvents (test plant)

Left: Ceramic membrane element (diameter: 180 mm, total length: 1,000 mm),
Right:System for separation of water content from solvents (test plant)

Using ceramic separation membranes, NGK has developed a system for recovering water content from solvents. This technology is scheduled for commercialization in fiscal 2011.

The system uses the world’s largest ceramic separation membrane (membrane area of 15 square meters) with pores under 1 nanometer (1 billionth of a meter) capable of separation at the molecular level. Off ering high corrosion resistance to solvents, acidic and alkali materials, the membrane is suitable for use with a wide range of liquids and pH levels. The membrane is also the first in the world with pores under 1 nanometer to be capable of treating acidic liquids.

Presently, the separation of water content from solvents is largely performed through distillation, which requires both a tremendous amount of heat energy and large equipment area. Separation via membrane, however, requires very little heat to operate, enabling a reduction of anywhere from one-tenth to one-half in both energy consumption and CO2 emissions compared to the distillation method. The area required for installation can also be cut almost in half.

The new membrane system is expected to be used in a range of applications, including the recovery of acid from acetic acid and other acidic liquids, and the separation and reduction of water content from liquid containing solvents ? such as water-soluble paint waste liquid ? and volatile organic compound (VOC) solvents.

Development of Human Resources Able to Create, Protect and Nurture Intellectual Property

Presentation on patent map utilization(June 2010)

Presentation on patent map utilization
(June 2010)

The NGK Group encourages the creation of intellectual property, and works to ensure its proper preservation and use, based on a policy of respect for the rights of others. Our business, research and development, and intellectual property divisions collaborate closely with the goal of building competitive advantage for the Company.

In fiscal 2010, we strengthened our patent filing and intellectual property protection eff orts in the Chinese market. We also established a Trademark Liaison Committee to manage NGK Group trademarks and bolster their strategic development. Additionally, we adopted an e-learning component as part of intellectual property training for personnel involved in this area. We also continued to promote our crash course on inventions, off ering practical seminars using real-world examples and teaching participants the skills needed to patent inventions.

In fiscal 2011, together with making these education programs more robust, we intend to expand and upgrade our managerial-class awareness programs to sharpen intellectual property strategies at business and R&D divisions.


NGK CSR menu

CSR

back to Products topback to CSR top


Page top

Copyright(C) 1997-2012 NGK INSULATORS, LTD. All rights reserved.
NGK INSULATORS, LTD.